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          Innovative Processes for Laser Annealing, Crystallization and Material Processing
  INNOVAVENT Laboratory for
Feasibility Studies

The INNOVAVENT laboratories are equipped with optical systems for creating line focus illumination. Pulsed ns lasers at 532 nm and cw diode lasers at 808 nm are available for sample processing.
Three clean rooms with a total floor space of more than 850 sqf provide an excellent environment for feasibility studies and development of laser based processes.
Our team has many years of experience in laser annealing and crystallization of thin semiconductor films and would be glad to discuss your application with you.


INNOVAVENT
uses lasers of the
JENOPTIK Laser, Optik, Systeme GmbH.

Laser dopant activation on a silicon wafer
 
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INNOVAVENT GmbH
Göttingen, Germany

Uniform silicon crystals, created with modern disk laser, optics and process technology
 
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             INNOVAVENT GmbH • Bertha-von-Suttner-Str. 5 • 37085 Göttingen Germany Tel. +49 (0) 551-90047-0 Fax +49 (0) 551-90047-19