Laser Optics for a Laser Line of 300 - 750mm Length using Pulsed Solid State UV Lasers
VOLCANO® Line Beam systems can be designed with different line lengths up to 750mm. The use of solid state lasers emitting UV light at 343nm reduces the operating costs and increases the uptime of production tools remarkably, compared to ELA systems using excimer lasers.
The LB systems are based on a rigid aluminum housing structure and the FALCON XXL projection lens gives a working distance of >200mm. A stable and solid system structure is needed to support the line beam optics. Line Beam Optics includes a MBC (Manual Beam Control) camera system which allows to control and adjust position and angle of all laser emitted beams. The FALCON XXL design contains a window which seals the optics from the process chamber and protects against contaminations from the process.
The energy density of 300mJ/cm² is obtained by using 4 TruMicro 8340 (40mJ specification) with 750mm x 50µm
VOLCANO LB 750UV SLA configuration including the µ-smoother
Scope of Application
VOLCANO® Laser Optics provides a gaussian laser line applied for annealing and crystallization of thin semiconductor film, e.g. amorphous silicon films. Thin 50 nm a-Si films play an important role for the manufacture of thin film transistors (TFT) in LCD and OLED flat panel displays. UV crystallization converts the silicon to poly-Si which allows short response time TFTs for high performance flat panel displays. These films are well suited for the TFT matrix of OLED displays. VOLCANO® Laser Optics has high availability (>90 %), is reliable and has low cost of ownership.
|Technical Data: VOLCANO® LB 750UV-4-8340 SLA|
2 Sigma ≤1.0% long axis
≥=300mJ/cm² @ 50µm FLATTOP
15-20ns, can be extended by delay trigger scheme
4x TruMicro 8340 (Trumpf Lasertechnik)
laser power meter, substrate power meter, substrate beam profiler, fast photodiode
|Other line sizes and other configurations on request.|
VOLCANO® Laser Optics includes an integrated attenuator module to adjust the energy density at the substrate level. Power meter heads, a CCD camera based beam profile measurement are available.